Quartz Focus Ring & Etch Ring
Precision-machined fused quartz focus rings, etch rings, and edge rings for plasma etching and CVD chambers — ±0.01 mm tolerance, Ra 0.1 μm surface finish.
By Semiconductor Process
Plasma-resistant quartz, sapphire, and ceramic components for wet, dry, and plasma etching tools where uniformity and cleanability are critical.
Focus rings, chambers, showerheads
6 results
Precision-machined fused quartz focus rings, etch rings, and edge rings for plasma etching and CVD chambers — ±0.01 mm tolerance, Ra 0.1 μm surface finish.
Blown and formed fused quartz bell jars and domes for CVD, epitaxy, and sputtering reactor enclosures — up to 500 mm diameter with hermetic weld flanges.
Welded fused quartz wet cleaning vessels for HF, SC-1, SC-2, and piranha semiconductor cleaning processes — single and cascade configurations, custom sizes.
Optically polished fused quartz and sapphire viewport windows for semiconductor process chamber monitoring — UV to mid-IR transmission, hermetic metal or CF flanges.
Single-crystal sapphire windows and optical flats for semiconductor process chambers — UV to mid-IR transmission, Ra < 0.1 nm, extreme plasma and chemical resistance.
Drawing-based custom fabrication of fused quartz, sapphire, and technical ceramic components — from prototype to production, any geometry, any specification.