Quartz Diffusion Tube
High-purity fused quartz diffusion and oxidation tubes for semiconductor furnaces — straight bore, flanged, and bell-end configurations for 4" to 12" wafer processes.
By Semiconductor Process
High-temperature quartz components for dopant diffusion, thermal oxidation, and furnace annealing lines that demand purity and dimensional stability above 1100°C.
Process tubes, wafer boats, flanges
7 results
High-purity fused quartz diffusion and oxidation tubes for semiconductor furnaces — straight bore, flanged, and bell-end configurations for 4" to 12" wafer processes.
Precision-machined fused quartz wafer boats for horizontal and vertical diffusion furnaces — 25-slot standard and custom slot count for 4" to 12" wafers.
Precision-machined fused quartz flanges, reducers, elbows, and tube fittings for semiconductor gas lines and furnace tube assemblies — compatible with standard metal flange interfaces.
Precision multi-hole quartz gas injectors and showerheads for uniform gas distribution in CVD, ALD, and diffusion furnace systems — hole arrays to ±0.02 mm positional accuracy.
Custom-machined fused quartz baffles, liners, and thermal shields for semiconductor furnace tubes, diffusion systems, and CVD reactors.
High-purity alumina and silicon carbide wafer carriers, boats, and cassettes for high-temperature semiconductor processes — superior wear resistance and thermal shock capability.
Drawing-based custom fabrication of fused quartz, sapphire, and technical ceramic components — from prototype to production, any geometry, any specification.