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Fused Quartz Trays, Bases & Wafer Boats for Wafer Processing
Custom fused quartz trays, bases, and wafer boats engineered for wafer handling in wet benches, etching, CVD/diffusion, cleaning, and high-temperature processes. Made from high-purity fused silica and precision-machined to your drawing, these carriers provide outstanding thermal stability, chemical inertness, smooth contact surfaces, and clean performance in critical environments.
What to Provide for a Quote
- Drawing (PDF/STEP) or key dimensions (Length × Width × Height, wall thickness)
- Wafer size and capacity (slot/pocket/post layout, pitch, spacing)
- Features required: drainage holes, overflow weirs, ribs, handles, feet/standoffs, lids/covers, identification marks
- Edge and surface finish requirements (chamfer/bevel, ground or polished surfaces)
- Operating environment (chemicals, wet bench/thermal process), maximum temperature, target cleanliness level
- Critical tolerances and flatness/parallelism targets
- Quantity (prototype or batch), inspection reports needed, and packaging level
Key Specifications
- Material: High-purity fused quartz (SiO₂); material certificate available by request
- Geometry: Rectangular/oval/round trays, bases, and wafer boats; integrated slots, pockets, posts, or ribs per drawing
- Dimensions: Per drawing (made-to-order); uniform wall thickness and reinforced sections as required
- Surface Finish: Fire-polished rims; ground or polished inner surfaces to minimize particle generation; deburred edges and smooth fillets
- Slot/Post Features: Custom slot count and pitch, pocket depth, post diameter/height; radiused corners to protect wafers
- Drainage & Flow: Drain holes, grooves, or overflow weirs designed for efficient chemical exchange and drying
- Handling Features: Handholds, alignment notches, feet/standoffs for stable placement; optional laser ID/flow marks
- Construction: Precision machining and flame-fused assemblies; stress-relief annealing available
- Cleanliness: Ultrasonic/DI rinse; Class-100 compatible packaging
Material Properties (Typical)
- High purity and low outgassing for cleanroom use
- Excellent chemical resistance to most acids/alkalis and organic solvents (note: quartz is not resistant to HF)
- Very low thermal expansion, good thermal-shock tolerance, and stability at high temperature
- Electrical insulation and high surface quality
Processing & Design Notes
- Prefer consistent wall thickness and generous internal radii to reduce stress and particle traps
- Bottom ribs or frames can improve stiffness and flatness for large formats
- Surface finish (ground vs. polished) selected based on process cleanliness and handling needs
- We can advise practical tolerances for slot/pitch uniformity, flatness, and parallelism based on size and geometry
Inspection & Testing
- Dimensional inspection: length/width/height; slot/post pitch and height; pocket depth; flatness/parallelism
- Visual inspection: 100% check for chips, cracks, inclusions, and contamination
- Optional: birefringence/stress check; surface finish verification; cleanliness verification report
Applications
Wafer cleaning and etching, wet bench processing, batch loading for CVD/diffusion/anneal, wafer transport and temporary storage, precision chemical processing
Packaging & Storage
Anti-static, vacuum-sealed packaging with shock-absorbent foam and rigid outer protection. Store dry (<40% RH) at 10–30 °C; keep away from HF-containing chemicals during storage.
Notes
Custom configurations (hole patterns, coatings, or additional markings) available upon request.
Compliance certificates (RoHS, ISO 9001) provided with bulk orders.