Ceramic Rods for Semiconductor Applications

Ceramic Rods for Semiconductor Applications

Our precision-machined custom ceramic rods and bars, available in high-purity Alumina (Al2O3), Zirconia (ZrO2), or Silicon Nitride (Si3N4), are engineered for demanding semiconductor, vacuum, and plasma etching processes. These high-performance components offer superior thermal, electrical, and mechanical properties, ensuring reliability in critical high-temperature environments.

Get A Free Inquiry

Made-to-Order Dimensions

• Per drawing (custom sizes and geometries)

Material Properties

• Base Material: Al₂O₃ (Alumina Ceramic) / Optional: ZrO₂, Si₃N₄
• Density: ≥3.90 g/cm³
• Flexural Strength: ≥350 MPa
• Thermal Conductivity: 24-30 W/(m·K)
• Dielectric Strength: ≥15 kV/mm

Tolerance & Surface Quality

• Concentricity: ≤0.05 mm (OD vs. ID)
• Parallelism: ≤0.03 mm (Top/Bottom Surfaces)
• Surface Roughness: Ra ≤0.4 μm

Key Performance Tests

• Dimensional Inspection: Per ISO 286-2
• Leakage Rate Test: ≤1×10⁻⁹ mbar·L/s (Helium Mass Spectrometry)
• Thermal Shock Resistance: ΔT ≥300°C (5 cycles, no cracks)

Applications

• Semiconductor Processing: Vacuum chambers, Plasma etching components
• High-Temperature Environments: ≤1600°C (Material-Dependent)

Packaging & Handling

• Cleanroom Packaging: Class 100 or better
• Anti-Static: ESD-safe containers

Quick Inquiry

If you want to know more about quartz glass or seek quartz glass solutions, contact us for professional services!

Available 24/7 via email or phone to help you with purchasing our quartz glass products, solutions, usage issues, or providing technical support.

请在浏览器中启用JavaScript来完成此表单。

Name (copy) *

前一页

后一页

Email *

Single Line Text

Comment or Message *

Send Message

Compliance Statement
Meets SEMI F47-0706 (Ceramic Components for Semiconductor Equipment)

Disclaimer
Customization available upon request. Critical parameters marked with “□” require explicit confirmation.