Ceramic Components for Semiconductor

Ceramic Components for Semiconductor

Precision custom ceramic components, machined from high-purity Alumina (Al2O3), Zirconia (ZrO2), and Silicon Nitride (Si3N4), are engineered for demanding semiconductor, high-temperature, and vacuum applications. Offering superior thermal, electrical, and mechanical performance, our bespoke parts are ideal for critical environments like plasma etching and vacuum chambers.

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Basic Dimensions

• Per drawing (custom sizes and geometries)

Material Properties

• Base Material: Al₂O₃ (Alumina Ceramic) / Optional: ZrO₂, Si₃N₄
• Density: ≥3.90 g/cm³
• Flexural Strength: ≥350 MPa
• Thermal Conductivity: 24-30 W/(m·K)
• Dielectric Strength: ≥15 kV/mm

Tolerance & Surface Quality

• Concentricity: ≤0.05 mm (OD vs. ID)
• Parallelism: ≤0.03 mm (Top/Bottom Surfaces)
• Surface Roughness: Ra ≤0.4 μm

Key Performance Tests

• Dimensional Inspection: Per ISO 286-2
• Leakage Rate Test: ≤1×10⁻⁹ mbar·L/s (Helium Mass Spectrometry)
• Thermal Shock Resistance: ΔT ≥300°C (5 cycles, no cracks)

Applications

• Semiconductor Processing: Vacuum chambers, Plasma etching components
• High-Temperature Environments: ≤1600°C (Material-Dependent)

Packaging & Handling

• Cleanroom Packaging: Class 100 or better
• Anti-Static: ESD-safe containers

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If you want to know more about quartz glass or seek quartz glass solutions, contact us for professional services!

Available 24/7 via email or phone to help you with purchasing our quartz glass products, solutions, usage issues, or providing technical support.

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