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4 inch Quartz Wafers & Optical Substrates
Our high-purity Fused Quartz wafers and optical substrates are engineered for demanding applications in semiconductor manufacturing, optical systems, and MEMS devices. Offering exceptional UV transparency, low thermal expansion, and superior surface quality, these wafers ensure precise, contamination-free performance in critical processing, testing, and lithography environments.
Material
- Base Material: High-purity synthetic fused silica (SiO₂ ≥99.99%)
- Optical Grade: UV-grade transparency with low hydroxyl (OH) content.
Dimensions
- Diameter :100 mm ±0.05 mm
- Thickness : 3 mm ±0.05 mm
- Edge Treatment : Fine-ground ≤0.3 mm chamfer
Physical Properties
- Density: 2.2 g/cm³
- Hardness: Mohs 5.5-6.5
- Thermal Expansion: 0.55 × 10⁻⁶/°C (20-300°C)
- Softening Point: 1683°C
Optical Properties
- Transmission Range: 190 nm (UV) to 2500 nm (IR)
- Refractive Index: 1.458 @ 587.6 nm (nd)
- Scratch-Dig: 60/40 (MIL-PRF-13830B)
- Surface Flatness: λ/4 @ 632.8 nm
Surface Specifications
- Ra Roughness : ≤5 Å (polished surfaces)
- Parallelism : ≤1 arcmin
Chemical Resistance
- Resistant to acids (except HF), water, and organic solvents.
Applications
- Optical windows, laser systems, UV lithography.
- Semiconductor processing, high-temperature viewports.
Certifications & Compliance
- RoHS compliant.
- Custom metrology reports available upon request.
Packaging
- Individually wrapped in anti-static foam.
- Shipped in rigid, crush-proof containers.
Notes
Avoid mechanical shock or direct contact with sharp objects.
Clean with IPA or acetone using lint-free wipes.
For full technical data or custom requests, contact email
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